• Title of article

    Photoelectron spectroscopy study of oxygen vacancy on vanadium oxides surface

  • Author/Authors

    Qi-Hui Wu، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    6
  • From page
    473
  • To page
    478
  • Abstract
    The thermal properties of vanadium pentoxide (V2O5) thin films have been studied by X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). XPS and UPS data demonstrate that V2O5 thin films are gradually reduced by annealing in the ultrahigh vacuum chamber at temperatures up to 400 8C due to the formation of oxygen vacancy. The oxygen defect in the remaining thin film leads to the appearance of a new emission line at about 10.3 eV in the valence bands, which is direct evidence for oxygen vacancy on a solid surface.
  • Keywords
    XPS , UPS , Oxygen vacancy , Vanadium pentoxide
  • Journal title
    Applied Surface Science
  • Serial Year
    2004
  • Journal title
    Applied Surface Science
  • Record number

    1000282