Title of article
The critical layer number of epitaxially grown Cu and Ni films with strained structure
Author/Authors
J.C. Li، نويسنده , , W. Liu، نويسنده , , Q. Jiang، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
3
From page
259
To page
261
Abstract
The thickness dependent structural transition of epitaxially grown thin films from a tetragonal structure to the corresponding
bulk structure is thermodynamically considered. It is found that there exists a competition between elastic energy of the
tetragonal structure and film–substrate interface energy. Equilibrium between these energies is present at a critical layer number
nc. The predictions for nc are in agreement with the experimental results of some different metallic films deposited on fcc
metallic substrates
Keywords
Interface energy , Metallic film , Elastic energy , Critical thickness
Journal title
Applied Surface Science
Serial Year
2005
Journal title
Applied Surface Science
Record number
1000528
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