Title of article
Micro-Raman study of photoexcited plasma in GaAs bevelled structures
Author/Authors
R. Srnanek، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
10
From page
96
To page
105
Abstract
The properties of the photoexcited plasma in n-GaAs and its influence on micro-Raman spectra were studied on bevelled
structures. The modes of the photoexcited free-carriers plasmon–LO–phonon (PLP) coupling have been detected in the surface
depletion layer at room temperature in continuum wave (CW) mode. The strong modifications of the intensities of TO–phonon
and LO–phonon modes were observed along the bevel. They were discussed in terms of scattering by PLP coupling. The
dependence of the ratio of the intensities of TO–phonons and LO–phonons was linear along the bevel in the region of the surface
depletion layer. The first derivative of this dependence is a characteristic value for the corresponding doping concentration. Five
Si-doped GaAs layers with different doping levels were analyzed in this way to obtain a calibration function for determining the
doping concentration profile in the very thin GaAs layers.
Keywords
Bevel , Photoexcited plasma , Plasmon–LO–phonon coupling , Micro-Raman , GaAs
Journal title
Applied Surface Science
Serial Year
2005
Journal title
Applied Surface Science
Record number
1000763
Link To Document