• Title of article

    Growth and characterization of Zn1 xCdxO films using remote plasma MOCVD

  • Author/Authors

    Junji Ishihara، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2005
  • Pages
    4
  • From page
    381
  • To page
    384
  • Abstract
    Zn1 xCdxO films were successfully grown by remote plasma enhanced metalorganic chemical vapor deposition (RPEMOCVD) with diethyl zinc, dimethyl cadmium, and oxygen plasma. The Cd composition x in the Zn1 xCdxO films was tuned by changing a flow rate of group-II sources. With increasing the Cd composition x, the crystal structure was changed from wurzite (WZ) to rock-salt (RS). The optical band-gap of the Zn1 xCdxO films with the wurzite structure up to x 0.7 varied from 3.3 eV down to 1.9 eV.
  • Keywords
    Remote plasma enhanced metalorganic chemical vapor deposition , Zn1 xCdxO , Dimethyl cadmium , Diethyl zinc
  • Journal title
    Applied Surface Science
  • Serial Year
    2005
  • Journal title
    Applied Surface Science
  • Record number

    1000891