Title of article
Preparation of CaS:Cu,F thin-film electroluminescent devices with an emission including purple region
Author/Authors
Shintaro Hakamata، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
4
From page
469
To page
472
Abstract
CaS:Cu,F thin films have been prepared aiming at development of purple-blue emitting thin-film electroluminescent (TFEL)
device with high luminance. The dependence of structural and photoluminescent (PL) properties of CaS:Cu,F thin films on
annealing temperature and time was investigated. It was found that the annealing at higher than 800 8C was necessary. Moreover,
improvement of crystallinity and PL properties of the films saturated for the annealing time longer than 10 min. It is concluded,
therefore that the annealing at higher than 800 8C for about 10 min is desirable. CaS:Cu,F TFEL devices was fabricated on Si
substrate. The purple-blue EL with an obvious peak at 425 nm was obtained from the device with 0.3 at.% of Cu for the first time
Keywords
Pl , El , Si substrate , Buffer layer , annealing , insulating layer
Journal title
Applied Surface Science
Serial Year
2005
Journal title
Applied Surface Science
Record number
1000911
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