Pulsed laser deposition of oxide thin films

The pulsed laser deposition (PLD) process was studied in detail during oxide thin film growth by constructing a sophisticated PLD chamber combined with an energy-stable excimer laser. It was revealed that the transmitting laser energy at the entrance view port decreased exponentially with deposition runs, roughly by A e 0.02x%, where A is the original transmission and x is the run number, and transmission loss could become considerable (up to 90%) in 100 deposition runs. In addition, area of the focused spot on the target was found a function of charging high voltage, which is a parameter of excimer laser operation, even through a slit forming rectangular sharp-edge beam profile. Laser energy density is one of the most important parameter governing grown film properties, and therefore accurate laser energy and spot area calibration is vital for reproducible film growth. In course of this study, the importance of spot area as well as the energy density is discussed in the view of deposition rate.