Title of article
GaN nucleation on (0 0 0 1)-sapphire via ion-induced nitridation of gallium
Author/Authors
A. Sidorenko، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
7
From page
7671
To page
7677
Abstract
The growth of epitaxial GaN films on (0 0 0 1)-sapphire has been investigated using X-ray photoelectron spectroscopy (XPS) and low energy
electron diffraction (LEED). In order to investigate the mechanism of the growth in detail, we have focused on the nitridation of pre-deposited Ga
layers (droplets) using ion beam-assisted molecular beam epitaxy (IBA-MBE). Comparative analysis of XPS core-level spectra and LEED patterns
reveals, that nitride films nucleate as epitaxial GaN islands. The wetting of the surface by GaN proceeds via reactive spreading of metallic Ga,
supplied from the droplets. The discussed growth model confirms, that excess of metallic Ga is beneficial for GaN nucleation
Journal title
Applied Surface Science
Serial Year
2006
Journal title
Applied Surface Science
Record number
1002602
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