Title of article
Nano-structured Fe thin film deposition using plasma focus device
Author/Authors
R.S. Rawat، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
5
From page
1611
To page
1615
Abstract
This paper reports the deposition of nano-structured Fe thin films using 3.3 kJ Mather-type plasma focus. The conventional hollow copper
anode was replaced by anode fitted with solid Fe top and the deposition was done using different numbers of deposition shots at two different
angular positions. Scanning Electron Microscopy shows that the size of nano-phase agglomerate is smaller when the sample is deposited using
either lesser number of deposition shots or at higher angular position with respect to anode axis. X-ray Diffraction shows that crystal structure
characteristics change with increase in number of deposition shots. Measurements of magnetic properties using Vibrating Sample Magnetometer
identify intermediate magnetization and coercivity in Fe thin films deposited at smaller angular position with respect to anode axis. It is concluded
that the morphological, structural and magnetic characteristics of Fe thin films deposited using plasma focus device depend not only on the number
of focus deposition shots but also on the angular position of the sample
Keywords
Plasma focus , Fe thin film , Nano-structure
Journal title
Applied Surface Science
Serial Year
2006
Journal title
Applied Surface Science
Record number
1003058
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