Title of article
The influence of different doping elements on microstructure, piezoelectric coefficient and resistivity of sputtered ZnO film
Author/Authors
X.B. Wang، نويسنده , , C. Song، نويسنده , , D.M. Li، نويسنده , , K.W. Geng، نويسنده , , F. Zeng، نويسنده , , F. Pan *، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2006
Pages
5
From page
1639
To page
1643
Abstract
ZnO film is attractive for high frequency surface acoustic wave device application when it is coupled with diamond. In order to get good
performance and reduce insertion loss of the device, it demands the ZnO film possessing high electrical resistivity and piezoelectric coefficient d33.
Doping ZnO film with some elements may be a desirable method. In this paper, the ZnO films undoped and doped with Cu, Ni, Co and Fe,
respectively (doping concentration is 2.0 at.%) are prepared by magnetron sputtering. The effect of different dopants on the microstructure,
piezoelectric coefficient d33, and electrical resistivity of the film are investigated. The results indicate that Cu dopant can enhance the c-axis
orientation and piezoelectric coefficient d33, the Cu and Ni dopant can increase electrical resistivity of the ZnO film up to 109 V cm. It is promising
to fabricate the ZnO films doped with Cu for SAW device applications
Keywords
Doping element , ZnO film , Electrical resistivity , Piezoelectric coefficient
Journal title
Applied Surface Science
Serial Year
2006
Journal title
Applied Surface Science
Record number
1003063
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