• Title of article

    Anisotropic diffusion of Cu adatoms on strained Cu (1 1 1) surface

  • Author/Authors

    Y.X. Wang، نويسنده , , Z.Y. Pan، نويسنده , , T.J. Liu، نويسنده , , X.M. Jiang، نويسنده , , L. Zhou، نويسنده , , J. Zhu، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2006
  • Pages
    5
  • From page
    1748
  • To page
    1752
  • Abstract
    Diffusion of Cu atoms on a strained Cu (1 1 1) surface was studied by molecular dynamic simulation using an EAM potential. The anisotropic diffusion behaviour is found when the uniaxial strain is imposed on the surface, which does not exist under the biaxial strain. The migration of the adatom is suppressed along the tensile strain direction. The results suggest that different island morphology can be obtained by controlling anisotropic diffusion of adatoms on the strained surfaces during film growth.
  • Keywords
    Diffusion of adatoms , Strained Cu (1 1 1) surface , Thin film growth , Molecular dynamic simulation
  • Journal title
    Applied Surface Science
  • Serial Year
    2006
  • Journal title
    Applied Surface Science
  • Record number

    1003081