Title of article
Properties of NiO thin films deposited by intermittent spray pyrolysis process
Author/Authors
B.A. Reguig، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
5
From page
4330
To page
4334
Abstract
NiO thin films have been grown on glass substrates by intermittent spray pyrolysis deposition of NiCl2 6H2O diluted in distilled water, using a
simple ‘‘perfume atomizer’’. The effect of the solution molarity on their properties was studied and compared to those of NiO thin films deposited
with a classical spray system. It is shown that NiO thin films crystallized in the NiO structure are achieved after deposition. Whatever the precursor
molarity, the grain size is around 25–30 nm. The crystallites are preferentially oriented along the (1 1 1) direction. All the films are p-type.
However, the thickness and the conductivity of the NiO films depend on the precursor contraction. By comparison with the properties of films
deposited by classical spray technique, it is shown that the critical precursor concentration, which induces strong thin films properties
perturbations, is higher when a perfume atomizer is used. This broader stability domain can be attributed to better chlorides decomposition
during the rest time used in the perfume atomizer technique.
Keywords
NiO thin films , Spray pyrolysis , p-Type transparent semiconductor
Journal title
Applied Surface Science
Serial Year
2007
Journal title
Applied Surface Science
Record number
1003490
Link To Document