RF-CF4 plasma surface modification of paper: Chemical evaluation of two sidedness with XPS/ATR-FTIR

The study was performed to examine the correlation between the initial roughness and surface fluorination of paper under RF-CF4 plasma environment. Based on the experimental observations, a correlation was observed between surface fluorination and plasma parameters, e.g. RF-power, treatment time and gas pressure. The level of fluorination with RF-CF4 plasma treatment was found to be extensive in both side of paper. Even very short treatment time, as low as 1 min at 300 W power, provides effective implantation of fluorine (38.7%) on surfaces. It was observed that, CF4 plasma treatment had a significant effect on the molecular fragmentation on both side of paper. However, the felt side have a much stronger effect on plasma-induced dissociation and fluorination than in the wire side of paper.