Title of article
4507–4511
Author/Authors
Fufang Zhou، نويسنده , , Yuan Ming Huang *، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
5
From page
4507
To page
4511
Abstract
By means of scanning electron microscopy and computer simulation, we have investigated the microstructures of a 23-mm-thick porous silicon
(PS) film and a 6-mm-thick PS film. The two films give off strong visible emissions when excited by the 254 nm light. For the 23-mm-thick PS film,
both of its cross-sectional and top-surface morphologies exhibit self-similarity whose small-scale and large-scale microstructures resemble one
another. For the 6-mm-thick PS film, self-similar cracks are developed on its top surface. Our results have demonstrated that the microstructures of
PS films exhibit the characteristics of fractals.With box counting method, the fractal dimensions of the PS films are calculated to be about 2.3–2.6.
Based on the model of diffusion-limited aggregation, the fractal growth processes have been simulated for the PS films
Keywords
Porous silicon , simulation , Fractals , nanoscale systems
Journal title
Applied Surface Science
Serial Year
2007
Journal title
Applied Surface Science
Record number
1003520
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