Surface modification of silicate glasses by nanoimprint using nanostriped NiO thin film molds

Nanoscale surface modification of silicate glasses was examined by applying nanoimprint technique using a nanostriped NiO thin film mold. The mold had the pattern composed of regularly arranged straight nanogrooves, which was formed by high-temperature annealing of the Li-doped NiO epitaxial thin film deposited on the atomically stepped sapphire (a-Al2O3 single crystal) substrate. The glass imprint was proceeded through the simple steps of heating ( 600 8C), pressing ( 1 kPa) and then cooling in air. The nanoimprinted glass surface transferred reversely from the mold exhibited the multi nanowire array having an interval of 80 nm, wire width of 70 nm, and wire height of 20 nm.