Title of article
Fundamentals and applications of ion–ion plasmas
Author/Authors
Demetre J. Economou *، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
9
From page
6672
To page
6680
Abstract
Ion–ion plasmas can form in the late afterglow of pulsed discharges or downstream of continuous wave discharges in electronegative gases. In
ion–ion plasmas, negative ions replace electrons as the negative charge carriers. In the absence of electrons, ion–ion plasmas behave quite
differently compared to conventional electron–ion plasmas. Application of a radio frequency bias to a substrate immersed in an ion–ion plasma can
be used to extract alternately positive and negative ions, thereby minimizing charging on device features during micro-device fabrication. Ion–ion
plasmas are also important in negative ion sources, dusty plasmas, and the D-layer of the earth’s atmosphere.
Keywords
afterglow , Negative ions , Charging damage , simulation , Pulsed plasma
Journal title
Applied Surface Science
Serial Year
2007
Journal title
Applied Surface Science
Record number
1003884
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