Title of article
The characteristics of platinum diffusion in n-type GaN
Author/Authors
Der-Hwa Yeh، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
5
From page
6910
To page
6914
Abstract
The electrical and optical characteristics of platinum (Pt) diffusion in n-type gallium nitride (GaN) film are investigated. The diffusion extent
was characterized by the SIMS technique. The temperature-dependent diffusion coefficients of Pt in n-GaN are 4.158 10 14, 1.572 10 13 and
3.216 10 13 cm2/s at a temperature of 650, 750 and 850 8C, respectively. The Pt diffusion constant and activation energy in GaN are
6.627 10 9 cm2/s and 0.914 eV, respectively. These results indicate that the major diffusion mechanism of Pt in GaN is possibly an interstitial
diffusion. In addition, it is also observed that the Pt atom may be a donor because the carrier concentration in Pt-diffused GaN is higher than that in
un-diffused GaN. The optical property is studied by temperature-dependent photoluminescence (PL) measurement. The thermal quenching of the
PL spectra for Pt-diffused GaN samples is also examined
Keywords
GaN , Platinum diffusion , SIMS , activation energy , Diffusion coefficient , PL
Journal title
Applied Surface Science
Serial Year
2007
Journal title
Applied Surface Science
Record number
1003917
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