Title of article
Structural characterization of nickel–titanium film on silicon carbide
Author/Authors
Petr Mach??، نويسنده , , Bohumil Barda، نويسنده , , Jaroslav Maixner، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
3
From page
1691
To page
1693
Abstract
The presented work describes behavior of contact structures of Ni/Ti type on 6H–SiC n-type. The best contact resistivity obtained is 3.3 × 10−4 Ω cm2. The structure showed excellent thermal stability, it was stable after being tested for 10 h at 900 °C. XRD analysis after annealing at 960 °C revealed orthorhombic Ni2Si as the dominate phase.
Keywords
Ohmic contact , nickel , XRD analysis , SiC , Titanium
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1008756
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