• Title of article

    Structural characterization of nickel–titanium film on silicon carbide

  • Author/Authors

    Petr Mach??، نويسنده , , Bohumil Barda، نويسنده , , Jaroslav Maixner، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2008
  • Pages
    3
  • From page
    1691
  • To page
    1693
  • Abstract
    The presented work describes behavior of contact structures of Ni/Ti type on 6H–SiC n-type. The best contact resistivity obtained is 3.3 × 10−4 Ω cm2. The structure showed excellent thermal stability, it was stable after being tested for 10 h at 900 °C. XRD analysis after annealing at 960 °C revealed orthorhombic Ni2Si as the dominate phase.
  • Keywords
    Ohmic contact , nickel , XRD analysis , SiC , Titanium
  • Journal title
    Applied Surface Science
  • Serial Year
    2008
  • Journal title
    Applied Surface Science
  • Record number

    1008756