Title of article
XPS characterization of sensitized n-TiO2 thin films for dye-sensitized solar cell applications
Author/Authors
Antonio Ot?vio T. Patroc?nio، نويسنده , , Eucler B. Paniago، نويسنده , , Roberto M. Paniago، نويسنده , , Neyde Y. Murakami Iha، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
6
From page
1874
To page
1879
Abstract
TiO2 thin films, employed in dye-sensitized solar cells, were prepared by the sol–gel method or directly by Degussa P25 oxide and their surfaces were characterized by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). The effect of adsorption of the cis-[Ru(dcbH2)2(NCS)2] dye, N3, on the surface of films was investigated. From XPS spectra taken before and after argon-ion sputtering procedure, the surface composition of inner and outer layers of sensitized films was obtained and a preferential etching of Ru peak in relation to the Ti and N ones was identified. The photoelectrochemical parameters were also evaluated and rationalized in terms of the morphological characteristics of the films.
Keywords
TiO2 , Dye-sensitized solar cells , Sputtering , XPS
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1008782
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