• Title of article

    Influence of charge deposition in a field-emission display panel

  • Author/Authors

    Lei Wei، نويسنده , , Xiaobing Zhang، نويسنده , , Chaogang Lou، نويسنده , , Zuoya Zhu، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2008
  • Pages
    6
  • From page
    2096
  • To page
    2101
  • Abstract
    Field-emission displays (FEDs) have been studied intensively in recent years as a candidate for flat-display panels in the future. In a FED, electrons emit from field emitters. Some electrons may impinge on the insulator surface between cathode and gate electrodes and cause charging of that surface because the yield of secondary electron emission is usually not equal to one. The charging of the insulator walls between cathode and gate electrodes is one of the important factors influencing the performance of a FED. In this paper, a simulation program is used to calculate this charge deposition, electric field distribution and electron trajectories. From the change of the electric field upon charge deposition in the triode region, it is shown that the insulator surface is negatively charged at a low gate voltage, e.g. 20 V. However, positive charge is deposited when the gate voltage is high, e.g. 100 V. The simulations also show that the emission current will increase even further after coating the dielectric with a thin film of a material with a high-secondary emission coefficient such as MgO. If a cone-shaped dielectric aperture is used in a triode, the emission current will decrease after charge deposition. However, the focus performance of the electron beam is improving in this case.
  • Keywords
    Secondary emission , Triode , Field distribution , MGO , Field-emission display , CNT , Surface charge
  • Journal title
    Applied Surface Science
  • Serial Year
    2008
  • Journal title
    Applied Surface Science
  • Record number

    1008820