Title of article
Formation of ZnTe by stacked elemental layer method
Author/Authors
K.C. Bhahada، نويسنده , , B. Tripathi and R. Munankarmy ، نويسنده , , N.K. Acharya، نويسنده , , P.K. Kulriya، نويسنده , , Y.K. Vijay، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2008
Pages
6
From page
2143
To page
2148
Abstract
Zn–Te bilayer thin films have been deposited on well-cleaned glass substrate using vacuum thermal evaporation technique under a vacuum of 5 × 10−5 Torr. These bilayer films have been modified by Swift heavy ion (SHI) irradiation, vacuum thermal annealing (VTA) and rapid thermal annealing (RTA). Characterization of ZnTe bilayer thin films have been performed by X-ray diffraction, optical reflectance, atomic force microscopy (AFM) and X-ray fluorescence (XRF) measurements. Irradiated ZnTe bilayer thin films have been obtained in cubic phase, Optical band gap values have been found in between the range of ZnTe compound. Increased surface roughness has been observed in irradiated films, compositional analysis has been confirmed by XRF measurements.
Keywords
XRD , Optical bandgap , AFM , Thin film of ZnTe , SHI
Journal title
Applied Surface Science
Serial Year
2008
Journal title
Applied Surface Science
Record number
1009989
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