• Title of article

    Roughness evolution of Si surfaces upon Ar ion erosion

  • Author/Authors

    V.I.T.A. de Rooij-Lohmann، نويسنده , , I.V. Kozhevnikov، نويسنده , , L. Peverini، نويسنده , , Toni E. Ziegler، نويسنده , , R. Cuerno، نويسنده , , F. Bijkerk، نويسنده , , A.E. Yakshin، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2010
  • Pages
    4
  • From page
    5011
  • To page
    5014
  • Abstract
    We studied the roughness evolution of Si surfaces upon Ar ion erosion in real time. Following the theory of surface kinetic roughening, a model proposed by Majaniemi was used to obtain the value of the dynamic scaling exponent β from our data. The model was found to explain both the observed roughening and the smoothening of the surfaces. The values of the scaling exponents α and β, important for establishing a universal model for ion erosion of (Si) surfaces, have been determined. The value of β proved to increase with decreasing ion energy, while the static scaling exponent α was found to be ion energy independent.
  • Keywords
    X-ray scattering , Ion erosion , Si , Dynamic scaling
  • Journal title
    Applied Surface Science
  • Serial Year
    2010
  • Journal title
    Applied Surface Science
  • Record number

    1012805