Title of article
Roughness evolution of Si surfaces upon Ar ion erosion
Author/Authors
V.I.T.A. de Rooij-Lohmann، نويسنده , , I.V. Kozhevnikov، نويسنده , , L. Peverini، نويسنده , , Toni E. Ziegler، نويسنده , , R. Cuerno، نويسنده , , F. Bijkerk، نويسنده , , A.E. Yakshin، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2010
Pages
4
From page
5011
To page
5014
Abstract
We studied the roughness evolution of Si surfaces upon Ar ion erosion in real time. Following the theory of surface kinetic roughening, a model proposed by Majaniemi was used to obtain the value of the dynamic scaling exponent β from our data. The model was found to explain both the observed roughening and the smoothening of the surfaces. The values of the scaling exponents α and β, important for establishing a universal model for ion erosion of (Si) surfaces, have been determined. The value of β proved to increase with decreasing ion energy, while the static scaling exponent α was found to be ion energy independent.
Keywords
X-ray scattering , Ion erosion , Si , Dynamic scaling
Journal title
Applied Surface Science
Serial Year
2010
Journal title
Applied Surface Science
Record number
1012805
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