Title of article
X-ray photoelectron spectroscopic analysis of the surface chemistry of silica nanowires
Author/Authors
Miles F. Beaux II، نويسنده , , Nathan J. Bridges، نويسنده , , Morgan DeHart، نويسنده , , Thomas E. Bitterwolf، نويسنده , , David N. McIlroy، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
6
From page
5766
To page
5771
Abstract
A thorough analysis of the surface chemistry of silica nanowires has been performed by X-ray photoelectron spectroscopy to investigate unexpected surface changes. Examination of the Si 2p, O 1s, and C 1s core level states before and after exposure of the nanowires to various liquid media showed that silica nanowires are capable of much higher surface hydroxyl concentrations than planar native oxides. It is further demonstrated that the nanowire surface hydroxyl concentration corresponds to the pH of the aqueous media to which the nanowires are exposed. Spectral feature changes due to water exposure similar to those observed for fibronectin binding suggests that fibronectin binding is competitively inhibited by slow changes in surface chemistry resulting from water exposure.
Keywords
XPS , Silica , Nanowire , Surface chemistry
Journal title
Applied Surface Science
Serial Year
2011
Journal title
Applied Surface Science
Record number
1014242
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