Structure and properties of (AlCrMnMoNiZrB0.1)Nx coatings prepared by reactive DC sputtering

The microstructure and properties of AlCrMnMoNiZrB0.1 nitride films prepared by reactive direct current sputtering at various N2-to-Ar flow ratios (RN) were investigated. The films had an amorphous structure at low RN and a face-centered cubic structure at a high RN. As the RN increased, the decrease in clusters and defects resulted in a dense columnar structure and low surface roughness. The peak hardness and modulus of the nitride films were 10.3 and 180 GPa, respectively. The enhanced hardness is ascribed to the increased metal–nitrogen bonding, solid solution strengthening of several metallic nitrides, and lattice strain. The nitride films deposited at RN = 0.2, 0.5, and 0.8 had friction coefficients of 0.16, 0.12 and 0.15, respectively. Wear-out failure occurred within 400 s when RN = 0 and 1.0. Adhesive wear was the dominant wear mechanism.