• Title of article

    Energy barriers for trimethylaluminum reaction with varying surface hydroxyl density

  • Author/Authors

    Dae Hee Kim، نويسنده , , Seung Bin Baek، نويسنده , , Yeong-Cheol Kim، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2011
  • Pages
    5
  • From page
    225
  • To page
    229
  • Abstract
    Energy barriers for trimethylaluminum (TMA) reaction with varying surface hydroxyl (–OH) density were investigated using density functional theory. When the surface –OH density increased from 0 to 6.8/nm2 on Si (0 0 1) surfaces, the energy barrier for TMA reaction with the surfaces decreased due to attractive interactions between TMA and –OH. When the surface –OH density further increased to 9.2/nm2 on a-SiO2 (0 0 1) surfaces, however, the trend was reversed. This was because the attractive interactions between TMA and –OH were decreased due to the attractive interactions of –OHʹs themselves via hydrogen bond at this high surface –OH density.
  • Keywords
    Atomic layer deposition , Trimethylaluminum , Surface hydroxyl density , Density functional theory
  • Journal title
    Applied Surface Science
  • Serial Year
    2011
  • Journal title
    Applied Surface Science
  • Record number

    1015179