Title of article
Energy barriers for trimethylaluminum reaction with varying surface hydroxyl density
Author/Authors
Dae Hee Kim، نويسنده , , Seung Bin Baek، نويسنده , , Yeong-Cheol Kim، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
5
From page
225
To page
229
Abstract
Energy barriers for trimethylaluminum (TMA) reaction with varying surface hydroxyl (–OH) density were investigated using density functional theory. When the surface –OH density increased from 0 to 6.8/nm2 on Si (0 0 1) surfaces, the energy barrier for TMA reaction with the surfaces decreased due to attractive interactions between TMA and –OH. When the surface –OH density further increased to 9.2/nm2 on a-SiO2 (0 0 1) surfaces, however, the trend was reversed. This was because the attractive interactions between TMA and –OH were decreased due to the attractive interactions of –OHʹs themselves via hydrogen bond at this high surface –OH density.
Keywords
Atomic layer deposition , Trimethylaluminum , Surface hydroxyl density , Density functional theory
Journal title
Applied Surface Science
Serial Year
2011
Journal title
Applied Surface Science
Record number
1015179
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