Title of article
Atomic-scale characterization of silicon diffusion on carbon nanotubes
Author/Authors
Hongyu Zhang، نويسنده , , Xuejuan Zhang، نويسنده , , Mingwen Zhao، نويسنده , , Zhenhai Wang، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2010
Pages
4
From page
610
To page
613
Abstract
Adsorption and diffusion of silicon on the exterior surface of carbon nanotubes are crucial for the growth of silicon carbide nanotubes (SiCNTs) from carbon nanotubes. We have carried out first-principles calculations to explore these processes. We found that a silicon atom prefers to be adsorbed at the bridge site above a C−C bond tilted to the tube axis with binding energy of 1.29−1.61 eV. The adsorbed silicon atoms have high mobility with diffusion energy barriers less than 0.06 eV. The energetically favorable diffusion paths are oriented along the tube axis.
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2010
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1048594
Link To Document