• Title of article

    Scattering by flexural phonons in suspended graphene under back gate induced strain

  • Author/Authors

    H. Ochoa، نويسنده , , Eduardo V. Castro، نويسنده , , M.I. Katsnelson، نويسنده , , F. Guinea، نويسنده ,

  • Issue Information
    ماهنامه با شماره پیاپی سال 2012
  • Pages
    4
  • From page
    963
  • To page
    966
  • Abstract
    We have studied electron scattering by out-of-plane (flexural) phonon modes in doped suspended graphene and its effect on charge transport. In the free-standing case (absence of strain) the flexural branch shows a quadratic dispersion relation, which becomes linear at long-wavelengths when the sample is under tension due to the rotational symmetry breaking. In the non-strained case, scattering by flexural phonons is the main limitation to electron mobility. This picture changes drastically when strains above View the MathML source are considered. Here we study in particular the case of back gate induced strain, and apply our theoretical findings to recent experiments in suspended graphene.
  • Keywords
    Graphene , Phonons , Strain , Resistivity
  • Journal title
    Physica E Low-dimensional Systems and Nanostructures
  • Serial Year
    2012
  • Journal title
    Physica E Low-dimensional Systems and Nanostructures
  • Record number

    1048985