• Title of article

    Semiconductor nanostructures with short depletion length and stacked gates, patterned with an atomic force microscope

  • Author/Authors

    T.M Heinzel، نويسنده , , R Held، نويسنده , , S Lüscher، نويسنده , , K Ensslin، نويسنده , , W Wegscheider، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2000
  • Pages
    4
  • From page
    860
  • To page
    863
  • Abstract
    We have investigated the electronic properties of the confining potentials obtained by oxidizing the surface of Ga[Al]As heterostructures with an atomic force microscope. From magnetotransport measurements on quantum wires at liquid-helium temperatures we find an extremely small lateral depletion length of (15±5) nm as well as a specularity of the boundary scattering above 95%. Furthermore, we demonstrate that this patterning technique for in-plane gates can be combined with top gate electrodes. Sufficiently thin top gates consisting of a suitable material can be patterned as well with an atomic force microscope, and the top gate structures can be aligned with respect to the in-plane gates.
  • Keywords
    Atomic force microscope , Semiconductor nanostructures , Nanolithography
  • Journal title
    Physica E Low-dimensional Systems and Nanostructures
  • Serial Year
    2000
  • Journal title
    Physica E Low-dimensional Systems and Nanostructures
  • Record number

    1049848