Title of article
Semiconductor nanostructures with short depletion length and stacked gates, patterned with an atomic force microscope
Author/Authors
T.M Heinzel، نويسنده , , R Held، نويسنده , , S Lüscher، نويسنده , , K Ensslin، نويسنده , , W Wegscheider، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2000
Pages
4
From page
860
To page
863
Abstract
We have investigated the electronic properties of the confining potentials obtained by oxidizing the surface of Ga[Al]As heterostructures with an atomic force microscope. From magnetotransport measurements on quantum wires at liquid-helium temperatures we find an extremely small lateral depletion length of (15±5) nm as well as a specularity of the boundary scattering above 95%. Furthermore, we demonstrate that this patterning technique for in-plane gates can be combined with top gate electrodes. Sufficiently thin top gates consisting of a suitable material can be patterned as well with an atomic force microscope, and the top gate structures can be aligned with respect to the in-plane gates.
Keywords
Atomic force microscope , Semiconductor nanostructures , Nanolithography
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2000
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1049848
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