Laterally patterned high mobility two-dimensional electron gases obtained by overgrowth of focused ion beam implanted Al1−xGaxAs

The use of focused ion beam implantation doping of an inverted GaAs/Al1−xGaxAs heterostructure during a growth interruption allows for the lateral modulation of the heterostructure doping. Hence, laterally patterned two dimensional electron gases (2DEGs) are obtained with no further processing steps required. We have performed the direct writing of a 2DEG with a Hall-bar pattern, such that only the application of ohmic contacts was necessary and the sample surface remained unharmed otherwise. The 2DEG has an electron density of View the MathML source and an electron mobility of View the MathML source, as determined by magnetotransport measurements. A conventional mesa-etched Hall-bar with almost identical electronic properties has also been studied. Different behaviour of the longitudinal as well as the transversal magnetoresistance for the two Hall-bars is observed and can be concluded to be due to a different confinement potential.