Title of article
Few-electron quantum dot fabricated with layered scanning force microscope lithography
Author/Authors
A. G. Grishin and M. Sigrist ، نويسنده , , S. Gustavsson، نويسنده , , T. Ihn، نويسنده , , K. Ensslin، نويسنده , , D. Driscoll، نويسنده , , A. Gossard، نويسنده , , M. Reinwald، نويسنده , , W. Wegscheider، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2006
Pages
4
From page
5
To page
8
Abstract
Few-electron quantum dots with integrated charge read-out have been fabricated by layered local anodic oxidation of a Ga[Al]As heterostructure and a thin Titanium top gate. The additional set of gates provided by the metallic film is used to tune the quantum dots into the few-electron regime. Current through the quantum dots and the quantum dot charge have been simultaneously measured for electron numbers varying between zero and two. The singlet–triplet splitting varies in two different samples between 0.5 and 1.5 meV. The Zeeman splitting of the first conductance resonance is observed in parallel magnetic field. The high tunability and straightforward implementation of these structures are promising for future nanostructure design.
Keywords
Few-electron quantum dot , Layered lithography , Scanning force microscope
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2006
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1051780
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