image-Factor tuning of 2D electrons in double-gated Si/SiGe quantum wells

We report on the design and first experiments of Si/SiGe heterostructures that allow gate-operated shifting of a 2D electron gas between two channels with different Landé g-factors. This allows gate-operated moving of electrons in and out of resonance in an electron spin resonance (ESR) experiment, which can act as a building block of a proposed solid-state quantum computer. We use MBE-grown modulation-doped quantum-wells (QWs) on SiGe pseudosubstrates with up to 30% Ge and low-temperature electron mobilities up to View the MathML source. A double QW structure with two different Ge contents separated by a thin barrier was optimized for this purpose with self-consistent simulations. The band structure simulations show that by applying gate voltages one can completely shift the wave function from one well to the other. First experiments on pure Si channels show the working of the gate setup. Both carrier density and mobility can be increased by using the back gate which corresponds to shifting the wave function in the channel.