Both-end opened nanostructure holes by embedded carbon nanotubes realized on thinned membranes on (1 0 0) silicon substrates

Vertically aligned carbon nanotubes (CNT) have been grown in a DC-PECVD apparatus on quartz membranes. 〈1 0 0〉-oriented Si wafer has been anisotropically etched in a KOH solution. A mixture of acetylene and hydrogen gases is used to grow CNT while Ni acts as the catalyst layer. As-grown structures have been coated by titanium dioxide using chemical vapor deposition at atmospheric pressure. By means of a polishing and ashing process steps followed by total removing of the quartz membrane both ends of CNTs are opened and nano holes are obtained. SEM analysis is used to study the evolution of such nanostructures.