Title of article
A new process for deposition of the CdTe thin films
Author/Authors
V.B. Patil، نويسنده , , P.D More، نويسنده , , D.S Sutrave، نويسنده , , G.S Shahane، نويسنده , , R.N Mulik، نويسنده , , L.P. Deshmukh a، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2000
Pages
6
From page
282
To page
287
Abstract
An extremely simple and cheap method for deposition of the n-CdTe thin films is presented. Good quality deposits are obtained at 75°C, 10±0.5 pH, and deposition time equal to 90 min. Light grey coloured and uniform CdTe layers of approximately 0.3 μm thick are obtained by this process. The compositional analyses showed that the baked CdTe films are little bit Cd-rich. The as-deposited CdTe layers are crystalline with a mixture of the hexagonal and cubic structures. The microscopic observations show some overgrowth on the grown spherical type crystallites which improve after baking at 100°C. Optical studies revealed a high absorption coefficient (104 cm−1) with a direct gap of 1.45 eV. The films are of the n-type conduction with a room temperature electrical resistivity of 106 Ω cm. The activation energies of an electrical conduction have been determined and the possible conduction mechanism is discussed.
Keywords
New process , n-CdTe , Hexagonal and cubic , Band gap , Direct transitions
Journal title
Materials Chemistry and Physics
Serial Year
2000
Journal title
Materials Chemistry and Physics
Record number
1060329
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