TiO2 ceramic films prepared by micro-plasma oxidation method for photodegradation of rhodamine B

Titanium dioxide ceramic films have been prepared on titanium board by the micro-plasma oxidation method. The influence of reaction voltage (120, 140, 160, 180, and 200 V) on the structural and surface morphology of the film was investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The photocatalytic activity of the film was evaluated by the photodegradation of rhodamine B (Rh B). It was found that the films produced were microporous and consisted of crystalline titanium dioxide. The micropore size and the content of anatase and rutile TiO2 phase increased with the applied voltage. The relatively higher degradation efficiency for Rh B was obtained in the film produced in the voltage of 160 V.