Title of article
The growth mechanism of micron-size V defects on the hydride vapor phase epitaxy grown undoped GaN films
Author/Authors
Pei-Yen Lin، نويسنده , , YewChung Sermon Wu، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2003
Pages
4
From page
397
To page
400
Abstract
Micron-size V defects were found on the hydride vapor phase epitaxy grown GaN films. When the film thickness increased, the diameter of V defects increased, but the density of the defects decreased. The defect has six {1 1̄ 0 1} facets, which encircle to form a concave hexagonal pyramid. Its shape is similar to that of epitaxial lateral overgrowth (ELO) GaN crystal grown on a dot-patterned GaN underlying layer. Through the analysis of the growth mechanism of ELO GaN, the growth mechanism of the V defects was investigated.
Keywords
Hydride vapor phase epitaxy , GaN , V defect , Epitaxial lateral overgrowth , Growth mechanism
Journal title
Materials Chemistry and Physics
Serial Year
2003
Journal title
Materials Chemistry and Physics
Record number
1061345
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