Title of article
Wet oxidation of thin AlAs in cylindrical composite of GaAs/AlAs/GaAs
Author/Authors
Sun-Chien Ko، نويسنده , , Sanboh Lee، نويسنده , , Y.T. Chou، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2011
Pages
5
From page
1341
To page
1345
Abstract
Lateral wet oxidation in a cylindrical composite, GaAs/AlAs/GaAs, with varying thickness of the AlAs layer has been investigated. The oxidation depth in AlAs was measured in the temperature range of 400–480 °C. At given temperature and time, the depth increases with the increase in thickness. The thickness effect was successfully interpreted based on the kinetic model of boundary layer diffusion. The results are consistent with the findings from early studies on samples of square and rectangular cross-sections with the same activation energy of the thermal process.
Keywords
Oxidation , Diffusion , Thin film , Semiconductors
Journal title
Materials Chemistry and Physics
Serial Year
2011
Journal title
Materials Chemistry and Physics
Record number
1066568
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