• Title of article

    Wet oxidation of thin AlAs in cylindrical composite of GaAs/AlAs/GaAs

  • Author/Authors

    Sun-Chien Ko، نويسنده , , Sanboh Lee، نويسنده , , Y.T. Chou، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2011
  • Pages
    5
  • From page
    1341
  • To page
    1345
  • Abstract
    Lateral wet oxidation in a cylindrical composite, GaAs/AlAs/GaAs, with varying thickness of the AlAs layer has been investigated. The oxidation depth in AlAs was measured in the temperature range of 400–480 °C. At given temperature and time, the depth increases with the increase in thickness. The thickness effect was successfully interpreted based on the kinetic model of boundary layer diffusion. The results are consistent with the findings from early studies on samples of square and rectangular cross-sections with the same activation energy of the thermal process.
  • Keywords
    Oxidation , Diffusion , Thin film , Semiconductors
  • Journal title
    Materials Chemistry and Physics
  • Serial Year
    2011
  • Journal title
    Materials Chemistry and Physics
  • Record number

    1066568