Title of article
Growth of a dry spot under a vapor bubble at high heat flux and high pressure
Author/Authors
V.S. Nikolayev، نويسنده , , D.A. Beysens، نويسنده , , G.-L. Lagier، نويسنده , , J. Hegseth، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2001
Pages
13
From page
3499
To page
3511
Abstract
We report a 2D modeling of the thermal diffusion-controlled growth of a vapor bubble attached to a heating surface during saturated boiling. The heat conduction problem is solved in a liquid that surrounds a bubble with a free boundary and in a semi-infinite solid heater by the boundary element method. At high system pressure the bubble is assumed to grow slowly, its shape being defined by the surface tension and the vapor recoil force, a force coming from the liquid evaporating into the bubble. It is shown that at some typical time the dry spot under the bubble begins to grow rapidly under the action of the vapor recoil. Such a bubble can eventually spread into a vapor film that can separate the liquid from the heater thus triggering the boiling crisis (critical heat flux).
Keywords
Boiling , CHF , Contact angle , Bubble growth , Vapor recoil
Journal title
INTERNATIONAL JOURNAL OF HEAT AND MASS TRANSFER
Serial Year
2001
Journal title
INTERNATIONAL JOURNAL OF HEAT AND MASS TRANSFER
Record number
1070572
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