• Title of article

    Influence of N-doping on the structural and photoluminescence properties of graphene oxide films Original Research Article

  • Author/Authors

    Tran Van Khai، نويسنده , , Han Gil Na، نويسنده , , Dong Sub Kwak، نويسنده , , Yong Jung Kwon، نويسنده , , Heon Ham، نويسنده , , KWANG BO SHIM، نويسنده , , HYOUN WOO KIM، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2012
  • Pages
    8
  • From page
    3799
  • To page
    3806
  • Abstract
    Nitrogen (N) was doped into graphene oxide (GO) films at temperatures of 600–900 °C under the flow of a mixture of NH3 and Ar. The N (atomic) concentration was varied in the range of 3.63–7.45%. XPS and FTIR spectra show that there are mainly single C–N and double Cdouble bond; length as m-dashN bonds in the GO sheet. Raman spectra indicate that the G band becomes closer to the position of the G band of graphite with increasing doping temperature, and thus reveal that N doping produces a blue-shift of the G-band. In room-temperature photoluminescence (PL) spectra, N-doping produces an increase not only in the overall PL intensity, but also in the wavelength of the peak maxima. The shift of the induced PL of N-doped graphene is attributed mainly to the increased number of graphitic (or quaternary) N.
  • Journal title
    Carbon
  • Serial Year
    2012
  • Journal title
    Carbon
  • Record number

    1124236