The anomalous low temperature resistivity and critical scattering of conduction electrons around the NÉEL point of α-Mn films containing dilute concentration of Ni Original Research Article

Electrical resistivity measurements on thermally evaporated Mn100−xNix films (with x=0.01, 0.02 and 0.05 at.% Ni) have been performed over the temperature range from 300 to 1.4 K using the van der Pauw four probe technique. The Néel point (TN) of the films determined using the model of Graig and Goldburg reveals a shift to upper values as the concentration of Ni is increased. Analysis of the resistivity data near the Néel points of these alloys gave critical exponents which are in moderate agreement with existing theories. The low temperature resistivity of the 0.02 and 0.05 at.% Ni in Mn specimens obeys a T2 law indicating a spin fluctuation scattering mechanism in these alloys.