Title of article
Simulations of faceted polycrystalline thin films: Asymptotic analysis Original Research Article
Author/Authors
Colin Ophus، نويسنده , , Erik Luber، نويسنده , , David Mitlin، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2009
Pages
10
From page
1327
To page
1336
Abstract
We have used a level set construction to simulate the growth of faceted polycrystalline thin films in 2 + 1 dimensions using the van der Drift model. The evolution of several different crystal geometries into their self-similar late-stage surfaces is described. Each simulation resulted in a columnar microstructure and growth statistics including grain diameter and area, RMS surface roughness and surface texture were collected at each time step. We describe the dependence of each of these statistical measures upon the crystal geometry.
Keywords
Thin film growth , computer simulation , Grain morphology , Chemical vapor deposition
Journal title
ACTA Materialia
Serial Year
2009
Journal title
ACTA Materialia
Record number
1144120
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