• Title of article

    Size-effect on stress behavior of the AlN/TiN film Original Research Article

  • Author/Authors

    D. Chen، نويسنده , , Y.M. Wang، نويسنده , , X.L. Ma، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2009
  • Pages
    7
  • From page
    2576
  • To page
    2582
  • Abstract
    The stress behavior of AlN/TiN superlattice film has been studied by means of a crystal-chemical atomic dynamics simulation based on first-principles calculations. The size-effects on stress behavior are demonstrated and discussed in detail. Stress behavior depends not only on AlN thickness but also on structural relaxation and strain distribution in the film. When the AlN thickness exceeds a critical one, the superlattice film is metastable. Stress behavior can be traced to the AlN/TiN interface structure and its variation with strain relaxation, which may reflect the main strain characteristics caused by AlN structural transformation in this film.
  • Keywords
    Superlattice , stress , Transformation , simulation
  • Journal title
    ACTA Materialia
  • Serial Year
    2009
  • Journal title
    ACTA Materialia
  • Record number

    1144243