Title of article
Growth mechanism of Ni3Sn4 in a Sn/Ni liquid/solid interfacial reaction Original Research Article
Author/Authors
J. Shen، نويسنده , , Y.C. Chan، نويسنده , , George S.Y Liu ، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2009
Pages
11
From page
5196
To page
5206
Abstract
The chemical interfacial reaction of Ni plates with eutectic Sn–3.5Ag lead-free solder was studied by microstructural observations and mathematical calculations. Compared with the Sn–3.5Ag–0.75Ni/Ni interfacial reaction, based on a simple model of the growth of the liquid/solid chemical compound layer, the growth mechanism of Ni3Sn4 in the Sn–3.5Ag/Ni interfacial reaction is discussed and presented. The growth process of Ni3Sn4 in the Sn/Ni liquid/solid reaction interface involves the net effect of several interrelated phenomena, such as volume diffusion, grain boundary diffusion, grain boundary grooving, grain coarsening, and dissolution into the molten solder. The growth time exponent n and morphology of Ni3Sn4 were found to be dependent on these factors.
Keywords
Interfacial reaction , Sn/Ni , Growth mechanism , Microstructure
Journal title
ACTA Materialia
Serial Year
2009
Journal title
ACTA Materialia
Record number
1144504
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