Title of article
The role of self-shadowing on growth and scaling laws of faceted polycrystalline thin films Original Research Article
Author/Authors
Colin Ophus، نويسنده , , Timo Ewalds، نويسنده , , Erik J. Luber، نويسنده , , David Mitlin، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2010
Pages
10
From page
5150
To page
5159
Abstract
We investigate, via both experiment and simulation, the effects of self-shadowing on the growth of faceted polycrystalline thin films. Faceted aluminum thin films were sputtered and the anomalous scaling behaviour of their surfaces was characterized. To understand the causes of this anomalous behavior, growth of faceted thin films was simulated by coupling a level set construction to a ballistic deposition model. The angular distribution function of deposition flux was varied to control the degree of self-shadowing. We show how differing degrees of self-shadowing strongly modify film surface morphologies and compare these results with experimental findings.
Keywords
Thin film growth , Vapor deposition , Grain morphology , Computer simulations
Journal title
ACTA Materialia
Serial Year
2010
Journal title
ACTA Materialia
Record number
1145100
Link To Document