Title of article
Parametric studies on pulsed near ultraviolet frequency tripled Nd:YAG laser micromachining of sapphire and silicon
Author/Authors
Tai-Chang Chen، نويسنده , , Robert B. Darling، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2005
Pages
5
From page
214
To page
218
Abstract
The use of a near ultraviolet Nd:YAG laser for rapid micromachining of sapphire and silicon has been systematically investigated. Cutting, marking and surface ablation of both materials have been produced by direct writing using a high-speed x–y galvanomechanical beam positioner. Machining results such as ablation rate and efficiency are discussed. The results show that the quality and efficiency of the laser machining depend on several factors, including focus length, beam feed rate (cutting speed) and the pulse repetition rate. The surface morphology and ablation rate indicate that the laser ablation process of sapphire could be a mixed photothermal and photochemical process, while that of silicon appears be dominated by a photothermal process when using a near UV nanosecond pulses.
Keywords
Laser micromachining , Sapphire , Ablation threshold , Ultraviolet laser , Silicon
Journal title
Journal of Materials Processing Technology
Serial Year
2005
Journal title
Journal of Materials Processing Technology
Record number
1179723
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