Title of article
Interfacial effect on thermal conductivity of Y2O3 thin films deposited on Al2O3
Author/Authors
Ho-Soon Yang، نويسنده , , J.W. Kim، نويسنده , , G.H. Park، نويسنده , , C.S. Kim، نويسنده , , K. Kyhm، نويسنده , , S.R Kim، نويسنده , , K.C. Kim، نويسنده , , K.S Hong، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2007
Pages
5
From page
50
To page
54
Abstract
The interfacial effect on thermal conductivity is studied with Y2O3 thin films deposited on an Al2O3 substrate. Y2O3 thin films with the thickness between 100 and 500 nm are prepared using rf magnetron sputtering and thermal conductivity of the films is measured using the 3ω method. The strong film thickness-dependent thermal conductivity due to the interfacial thermal resistance is observed. The film thickness-dependent thermal conductivity is explained by an interface thermal resistance between the film and substrate.
Keywords
Interfacial thermal resistance , 3? method , Thermal conductivity , Yttrium oxide , RF magnetron sputtering , Aluminum oxide
Journal title
Thermochimica Acta
Serial Year
2007
Journal title
Thermochimica Acta
Record number
1197506
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