Integration of CFD and Nelder–Mead algorithm for optimization of MOCVD process in an atmospheric pressure vertical rotating disk reactor

In this work, optimization of metalorganic chemical vapor deposition process for uniform layer thickness with especial attention to reactor geometric parameters as decision variables is presented. A numerical solution to a steady thermal flow associated with multi-species and chemical reactions in atmospheric pressure axisymmetrical rotating disk reactor by the CFD technique is obtained. Such a simulation is conducted on the assumption that the low Mach number flow is laminar. Then the validation of the numerical results with the benchmark solutions is conducted. Finally, integrating the CFD simulator with an optimization program, based on the Nelder–Mead algorithm, as a new approach is carried out to obtain the optimum value of decision variables. The obtained optimum configuration, results in a decrease in thickness deviation of deposited film from 29.8% to 16.5%.