• Title of article

    Intrinsic kinetics of thiophene hydrodesulfurization on a sulfided NiMo/SiO2 planar model catalyst

  • Author/Authors

    A. Borgna، نويسنده , , E.J.M. Hensen، نويسنده , , J.A.R van Veen، نويسنده , , J.W. Niemantsverdriet، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    8
  • From page
    541
  • To page
    548
  • Abstract
    The kinetics of thiophene hydrodesulfurization is studied on a planar surface science model of a sulfided NiMo/SiO2 catalyst under diffusion-limitation-free conditions in a batch reactor at atmospheric pressure and temperatures between 575 and 675 K. A Langmuir–Hinshelwood model is used to analyze the data and to derive activation energies and heats of adsorption for thiophene and hydrogen sulfide. The work illustrates the feasibility of kinetic and mechanistic studies using planar models of catalysts which can be prepared and manipulated with procedures available in surface science.
  • Keywords
    Enantioselective cyclopropanation , Immobilized chiral catalysts
  • Journal title
    Journal of Catalysis
  • Serial Year
    2004
  • Journal title
    Journal of Catalysis
  • Record number

    1222935