Title of article
Intrinsic kinetics of thiophene hydrodesulfurization on a sulfided NiMo/SiO2 planar model catalyst
Author/Authors
A. Borgna، نويسنده , , E.J.M. Hensen، نويسنده , , J.A.R van Veen، نويسنده , , J.W. Niemantsverdriet، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
8
From page
541
To page
548
Abstract
The kinetics of thiophene hydrodesulfurization is studied on a planar surface science model of a sulfided NiMo/SiO2 catalyst under diffusion-limitation-free conditions in a batch reactor at atmospheric pressure and temperatures between 575 and 675 K. A Langmuir–Hinshelwood model is used to analyze the data and to derive activation energies and heats of adsorption for thiophene and hydrogen sulfide. The work illustrates the feasibility of kinetic and mechanistic studies using planar models of catalysts which can be prepared and manipulated with procedures available in surface science.
Keywords
Enantioselective cyclopropanation , Immobilized chiral catalysts
Journal title
Journal of Catalysis
Serial Year
2004
Journal title
Journal of Catalysis
Record number
1222935
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