Sputtering-pressure dependence of magnetic properties in amorphous Tb40(FeCoV)60 films

The Tb40(Fe49Co49V2)60 films were fabricated by magnetron cosputtering from a multiple target arrangement at different argon pressures. The samples were investigated using X-ray diffraction, magnetic force microscope and vibrating sample magnetometer. A strong perpendicular anisotropy was obtained for the sample prepared at 0.4 Pa. The easy direction of magnetization could be turned from perpendicular to in-plane direction either at high working pressures (PAr>2.0 Pa) or by annealing at temperatures higher than 250 °C. An excellent magnetic softness with coercivity below 3 mT and saturating field of 20 mT in film-plane direction was obtained for the sample prepared at 0.7 Pa and then annealed at 350 °C.