Ferroelectric lithography

The fact that domain polarization affects the surface properties suggests a method to direct chemical reactions on ferroelectric substrates. In combination with domain manipulation at small scales, a new lithography process is developed to assemble several classes of nanostructures. Three domain patterning techniques, which employ contact electrodes, SPM and e-beam are introduced, with focus on the physical interactions between electrons and ferroelectrics. The effects of electron beam parameters on polarization reorientation are quantified and it is shown that both positive and negative polarization can be achieved depending on conditions. Potential applications of ferroelectric lithography on fabrication of complex structures are illustrated.