• Title of article

    Study of oxidation process of Cr/Cu/Cr thin film electrodes Original Research Article

  • Author/Authors

    Junlin Yuan، نويسنده , , Weixiang Weng، نويسنده , , Zhilong Lin Tailiang Guo، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2009
  • Pages
    5
  • From page
    1496
  • To page
    1500
  • Abstract
    Understanding the oxidation process of Cr/Cu/Cr laminated thin film electrode is important for developing new oxidation-resistant electrodes. By studying the evolution of crystal structure, morphology and electric resistivity of Cr/Cu/Cr thin films and electrodes that were post-annealed at different temperatures, the oxidation mechanism and process of Cr/Cu/Cr electrode were proposed. Copper is first oxidized into Cu2O at low temperatures (<310 °C), and converts to CuO phase at higher temperatures. Two pathways for oxygen diffusion were identified: diffusion from the protective Cr layer, and diffusion from the sidewall of electrode, of which the latter one leads to total oxidation of copper interlayer at high temperatures (>310 °C). As a result, the passivation of Cu metal at electrode sidewalls is crucial in reducing oxidation of Cr/Cu/Cr electrodes or designing new copper-containing oxidation-resistant electrodes.
  • Keywords
    A. Thin films , C. X-ray diffraction , D. Electrical conductivity , A. Metals
  • Journal title
    Journal of Physics and Chemistry of Solids
  • Serial Year
    2009
  • Journal title
    Journal of Physics and Chemistry of Solids
  • Record number

    1310891