Title of article
Controlled thermal decomposition of NaSi to derive silicon clathrate compounds
Author/Authors
Hiro-omi Horie، نويسنده , , Takashi Kikudome، نويسنده , , Kyosuke Teramura، نويسنده , , Shoji Yamanaka، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
7
From page
129
To page
135
Abstract
Formation conditions of two types of sodium containing silicon clathrate compounds were determined by the controlled thermal decomposition of sodium monosilicide NaSi under vacuum. The decomposition began at 360 °C. Much higher decomposition temperatures and the presence of sodium metal vapor were favorable for the formation of type I clathrate compound Na8Si46. Type II clathrate compound NaxSi136 was obtained as a single phase at a decomposition temperature <440 °C under the condition without sodium metal vapor. The type I clathrate compound was decomposed to crystalline Si above 520 °C. The type II clathrate compound was thermally more stable, and retained at least up to 550 °C in vacuum.
Keywords
Silicon clathrate , Thermal decomposition , Sodium monosilicide
Journal title
JOURNAL OF SOLID STATE CHEMISTRY
Serial Year
2009
Journal title
JOURNAL OF SOLID STATE CHEMISTRY
Record number
1333581
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